An innovative surface technology to provide durable anti-adherent surfaces 

Ion implantation is a process carried out in a vacuum chamber (<10-4 mbar) which consists at bombarding the surface of a material by ions having an energy between 10 and 200 KeV. Ions violently penetrate the surface of the material and can therefore change its physicochemical properties. The ion implantation technique is being developed for the treatment of material surfaces (metals, polymers, elastomers, ...). Depending on the implanted ions it is possible to obtain several effects :  re-alloying, amorphization or even a nano-structuring conferring on the material properties that are new or already existing but greatly improved. Improvements in hardness, friction coefficient, crack resistance, corrosion resistance are some examples of the benefits that ion implantation can bring to a variety of materials: steels, copper, gold, titanium, magnesium, polymers, elastomers, ...).


- L
ow temperature treatment allowing the preservation of the original mechanical and electrical characteristics of the material;

- Delamination impossible due to the fusion bond of the layer with the substrate;
- Reduced preparation of the substrate (degreasing generally sufficient)
- Environmentally friendly treatment thanks to the total absence of effluent.


In CHOPIN, the implantation of fluorine is considered to obtain a Teflon-like surface without application of a coating. 
Avoiding the creation of interface and keeping or even increasing the surface hardness should potentially lead to a durable anticontamination solution

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