ION IMPLANTATION TECHNOLOGY
Ion implantation is a process carried out in a vacuum chamber (<10-4 mbar) which consists at bombarding the surface of a material by ions having an energy between 10 and 200 KeV. Ions violently penetrate the surface of the material and can therefore change its physicochemical properties. The ion implantation technique is being developed for the treatment of material surfaces (metals, polymers, elastomers, ...). Depending on the implanted ions it is possible to obtain several effects : re-alloying, amorphization or even a nano-structuring conferring on the material properties that are new or already existing but greatly improved. Improvements in hardness, friction coefficient, crack resistance, corrosion resistance are some examples of the benefits that ion implantation can bring to a variety of materials: steels, copper, gold, titanium, magnesium, polymers, elastomers, ...).
THE ADVANTAGES
- Delamination impossible due to the fusion bond of the layer with the substrate;- Reduced preparation of the substrate (degreasing generally sufficient)- Environmentally friendly treatment thanks to the total absence of effluent.
IN THE CHOPIN PROJECT